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<http://experiment.worldcat.org/entity/work/data/1102421928.nt> <http://schema.org/about> <http://worldcat.org/entity/work/id/1102421928> .
<http://worldcat.org/entity/work/id/1102421928> <http://schema.org/creator> <http://worldcat.org/entity/person/id/2628840563> .
<http://worldcat.org/entity/work/id/1102421928> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/CreativeWork> .
<http://worldcat.org/entity/work/id/1102421928> <http://schema.org/workExample> <http://www.worldcat.org/oclc/2952147> .
<http://worldcat.org/entity/work/id/1102421928> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85077598> .
<http://worldcat.org/entity/work/id/1102421928> <http://schema.org/about> <http://id.worldcat.org/fast/1000268> .
<http://worldcat.org/entity/work/id/1102421928> <http://schema.org/name> "Instruments for quality control in lithography" .