""Chow and Lee's International Intellectual Property: Problems, Cases, and Materials addresses the latest developments in U.S., EU, and WTO law. It contains numerous new cases, replacing older ones. The text remains concise and retains the features of the first edition that made it popular: clear expositions of the law and many short, practical, and straightforward problems that liven class discussions and draw home the lessons to the students."--Publisher's website."
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