<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://id.worldcat.org/fast/1062817> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/823719930> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/fizyczne_osadzanie_z_fazy_gazowej> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/468564513> .
<http://worldcat.org/entity/work/id/23498366> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/CreativeWork> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/797375377> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicio_en_fase_de_vapor> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/couches_minces> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/peliculas_delgadas> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/creator> <http://worldcat.org/entity/person/id/2638873425> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://id.worldcat.org/fast/1150018> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/depot_en_phase_vapeur> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/author> <http://worldcat.org/entity/person/id/2638873425> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/40954144> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/name> "Physical vapor deposition of thin films" .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/vapor_plating> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/pvd_verfahren> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/author> <http://worldcat.org/entity/person/id/2736469360> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/807480127> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicion_en_fase_de_vapor> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/833613444> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85134864> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2002010597> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/pel_licules_fines> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/workExample> <http://www.worldcat.org/oclc/782254979> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/warstwy_cienkie_fizyka> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicio_metal_lurgia> .
<http://worldcat.org/entity/work/id/23498366> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/23498366#Topic/films_sottili> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/vapor_plating> <http://schema.org/name> "Vapor-plating." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/vapor_plating> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/depot_en_phase_vapeur> <http://schema.org/name> "Dépôt en phase vapeur." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/depot_en_phase_vapeur> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/couches_minces> <http://schema.org/name> "Couches minces." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/couches_minces> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/pel_licules_fines> <http://schema.org/name> "Pel·lícules fines." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/pel_licules_fines> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/films_sottili> <http://schema.org/name> "Films sottili." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/films_sottili> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/peliculas_delgadas> <http://schema.org/name> "Películas delgadas." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/peliculas_delgadas> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/fizyczne_osadzanie_z_fazy_gazowej> <http://schema.org/name> "Fizyczne osadzanie z fazy gazowej." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/fizyczne_osadzanie_z_fazy_gazowej> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicion_en_fase_de_vapor> <http://schema.org/name> "Deposición en fase de vapor." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicion_en_fase_de_vapor> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicio_metal_lurgia> <http://schema.org/name> "Deposició (Metal·lúrgia)" .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicio_metal_lurgia> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicio_en_fase_de_vapor> <http://schema.org/name> "Deposició en fase de vapor." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/deposicio_en_fase_de_vapor> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/warstwy_cienkie_fizyka> <http://schema.org/name> "Warstwy cienkie (fizyka)." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/warstwy_cienkie_fizyka> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/pvd_verfahren> <http://schema.org/name> "PVD-Verfahren." .
<http://experiment.worldcat.org/entity/work/data/23498366#Topic/pvd_verfahren> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/23498366.nt> <http://rdfs.org/ns/void#inDataset> <http://purl.oclc.org/dataset/WorldCat/Works> .
<http://experiment.worldcat.org/entity/work/data/23498366.nt> <http://schema.org/about> <http://worldcat.org/entity/work/id/23498366> .