<http://experiment.worldcat.org/entity/work/data/33432036.nt> <http://rdfs.org/ns/void#inDataset> <http://purl.oclc.org/dataset/WorldCat/Works> .
<http://experiment.worldcat.org/entity/work/data/33432036.nt> <http://schema.org/about> <http://worldcat.org/entity/work/id/33432036> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/contributor> <http://viaf.org/viaf/146202023> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/contributor> <http://worldcat.org/entity/person/id/2640448410> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85053380> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/about> <http://id.worldcat.org/fast/938622> .
<http://worldcat.org/entity/work/id/33432036> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/CreativeWork> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/name> "Two-stage gas measurement system patent application"@en .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/contributor> <http://id.loc.gov/authorities/names/n78087581> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/workExample> <http://www.worldcat.org/oclc/31093674> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/contributor> <http://worldcat.org/entity/person/id/2684470266> .
<http://worldcat.org/entity/work/id/33432036> <http://schema.org/creator> <http://worldcat.org/entity/person/id/2630487400> .
<http://worldcat.org/entity/work/id/33432036> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Book> .