Nano-CMOS design for manufacturability robust circuit and physical design for sub-65 nm technology nodes
"Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions."--Jacket.
""Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions."--Jacket."
""Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions."--Jacket."@en
"This is a practical and highly advanced tutorial on sub-wavelength lithography, stress engineering, and developments in the EDA arena to support designs in the Nano-CMOS arena. The text provides design and implementation methodology to enable the reader to successfully design on Nano-CMOS era technology."
"This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. It also tackles complex issues in the design process and introduces several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions."@en
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Circuits intégrés Conception et construction Applications industrielles.
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Circuits intégrés numériques Conception et construction.
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MOS complémentaires Conception et construction Applications industrielles.
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MOS tranzystory komplementarne projektowanie i konstrukcja.
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Transistors MOS complementaris Disseny i construcció.
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