Linked Data Explorerhttp://worldcat.org/entity/work/id/5101282
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV March 14-15, 1985, Santa Clara, California
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http://schema.org/about
- http://id.worldcat.org/fast/1000292
- http://id.loc.gov/authorities/subjects/sh2008114009
- http://experiment.worldcat.org/entity/work/data/5101282#Topic/photolithographie_halbleitertechnologie
- http://id.loc.gov/authorities/subjects/sh2009130002
- http://id.loc.gov/authorities/subjects/sh85067791
- http://id.worldcat.org/fast/978566
- http://id.worldcat.org/fast/1181834
- http://experiment.worldcat.org/entity/work/data/5101282#Topic/kongress
http://schema.org/genre
- "Santa Clara (Calif., 1986)"
- "Conference papers and proceedings"@en
- "Conference papers and proceedings"
http://schema.org/name
- "Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV March 14-15, 1985, Santa Clara, California"@en
- "Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California"
- "Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV"