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Metrology, inspection, and process control for microlithography XI 10-12 March, 1997, Santa Clara, California
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- http://experiment.worldcat.org/entity/work/data/791896983#Topic/fabrication_controle_congres
- http://id.loc.gov/authorities/subjects/sh85107135
- http://id.worldcat.org/fast/1078020
- http://id.loc.gov/authorities/subjects/sh85084858
- http://id.loc.gov/authorities/subjects/sh2008107753
- http://id.worldcat.org/fast/975565
- http://id.worldcat.org/fast/975582
- http://id.loc.gov/authorities/subjects/sh2008110073
- http://experiment.worldcat.org/entity/work/data/791896983#Topic/microlithographie_congres
- http://experiment.worldcat.org/entity/work/data/791896983#Topic/circuits_integres_inspection_congres
- http://id.worldcat.org/fast/1019883
- http://id.loc.gov/authorities/subjects/sh85067117
http://schema.org/alternateName
- "Metrology, inspection, and process control for microlithography 11"
- "Metrology, inspection, and process control for microlithography eleven"
http://schema.org/contributor
- http://experiment.worldcat.org/entity/work/data/791896983#Organization/semiconductor_equipment_and_materials_international_mountain_view_ca
- http://experiment.worldcat.org/entity/work/data/791896983#Meeting/integrated_circuit_metrology_inspection_and_process_control
- http://id.loc.gov/authorities/names/n90682619
- http://viaf.org/viaf/167606997
- http://id.loc.gov/authorities/names/nr91015579
- http://experiment.worldcat.org/entity/work/data/791896983#Organization/sematech_organisation
- http://viaf.org/viaf/139001886
- http://worldcat.org/entity/person/id/2640972292
- http://viaf.org/viaf/138507021
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- http://experiment.worldcat.org/entity/work/data/791896983#Organization/spie_digital_library
http://schema.org/genre
- "Conference papers and proceedings"@en
- "Conference papers and proceedings"
http://schema.org/name
- "Metrology, inspection, and process control for microlithography XI : 10-12 March 1997, Santa Clara, California"
- "Metrology, inspection, and process control for microlithography XI 10-12 March 1997, Santa Clara, California"
- "Metrology, inspection, and process control for microlithography XI 10-12 March, 1997, Santa Clara, California"
- "Metrology, inspection, and process control for microlithography XI 10-12 March, 1997, Santa Clara, California"@en
- "Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California"@en
- "Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California"