<http://experiment.worldcat.org/entity/work/data/791908255#Topic/fabrication_controle_congres> <http://schema.org/name> "Fabrication Contrôle Congrès." .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/fabrication_controle_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/genre> "Conference papers and proceedings" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/genre> "Conference papers and proceedings"@en .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791908255#Topic/fabrication_controle_congres> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.worldcat.org/fast/975565> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2008110073> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February - 1 March 2007, San Jose, California, USA. Pt. 3" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/850164137> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791908255#Topic/microlithographie_congres> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791908255#Organization/society_of_photo_optical_instrumentation_engineers_u_s> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/840399168> .
<http://worldcat.org/entity/work/id/791908255> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/CreativeWork> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_austin_tx> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/144757560> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_austin_tex> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85067117> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/636578881> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.worldcat.org/fast/1019883> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February-1 March 2007, San Jose, California, USA" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/840399083> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.worldcat.org/fast/975535> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://viaf.org/viaf/159263522> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.worldcat.org/fast/1078020> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February - 1 March 2007, San Jose, California, USA. Pt. 2" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://viaf.org/viaf/263264606> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA"@en .
<http://worldcat.org/entity/work/id/791908255> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Book> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85107135> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/144527799> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/759722927> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791908255#Topic/circuits_integres_mesure_congres> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://worldcat.org/entity/person/id/2634615055> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://viaf.org/viaf/167606997> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2008107753> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.worldcat.org/fast/975582> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_inc> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85084858> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://id.loc.gov/authorities/names/no2001094348> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/458745873> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://id.loc.gov/authorities/names/nr91015579> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791908255#Meeting/conference_2007_02_26_03_01_san_jose_calif> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/839642492> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/836602038> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February - 1 March 2007, San Jose, California, USA. Pt. 1" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI 26 February-1 March 2007, San Jose, California, USA" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI : 26 February - 1 March 2007, San Jose, California, USA Pt. 1" .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/workExample> <http://www.worldcat.org/oclc/840399167> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791908255#Organization/society_of_photo_optical_instrumentation_engineers_united_states> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791908255#Topic/circuits_integres_inspection_congres> .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI 26 February- 1 March 2007, San Jose, California, USA"@en .
<http://worldcat.org/entity/work/id/791908255> <http://schema.org/name> "Metrology, inspection, and process control for microlithography XXI 26 February- 1 March 2007, San Jose, California, USA" .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/society_of_photo_optical_instrumentation_engineers_united_states> <http://schema.org/name> "Society of Photo-optical Instrumentation Engineers (United States)" .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/society_of_photo_optical_instrumentation_engineers_united_states> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/circuits_integres_mesure_congres> <http://schema.org/name> "Circuits intégrés Mesure Congrès." .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/circuits_integres_mesure_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_austin_tex> <http://schema.org/name> "SEMATECH (Austin, Tex.)" .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_austin_tex> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/society_of_photo_optical_instrumentation_engineers_u_s> <http://schema.org/name> "Society of Photo-optical Instrumentation Engineers (U.S.)" .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/society_of_photo_optical_instrumentation_engineers_u_s> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_austin_tx> <http://schema.org/name> "SEMATECH (Austin, TX)" .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_austin_tx> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/circuits_integres_inspection_congres> <http://schema.org/name> "Circuits intégrés Inspection Congrès." .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/circuits_integres_inspection_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/microlithographie_congres> <http://schema.org/name> "Microlithographie Congrès." .
<http://experiment.worldcat.org/entity/work/data/791908255#Topic/microlithographie_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791908255.nt> <http://rdfs.org/ns/void#inDataset> <http://purl.oclc.org/dataset/WorldCat/Works> .
<http://experiment.worldcat.org/entity/work/data/791908255.nt> <http://schema.org/about> <http://worldcat.org/entity/work/id/791908255> .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_inc> <http://schema.org/name> "SEMATECH, Inc." .
<http://experiment.worldcat.org/entity/work/data/791908255#Organization/sematech_inc> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791908255#Meeting/conference_2007_02_26_03_01_san_jose_calif> <http://schema.org/name> "Conference (2007.02.26-03.01 San Jose, Calif.)" .
<http://experiment.worldcat.org/entity/work/data/791908255#Meeting/conference_2007_02_26_03_01_san_jose_calif> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://www.productontology.org/id/Meeting> .
<http://experiment.worldcat.org/entity/work/data/791908255#Meeting/conference_2007_02_26_03_01_san_jose_calif> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Event> .