<http://experiment.worldcat.org/entity/work/data/791976905#Organization/semiconductor_equipment_and_materials_international_mountain_view_ca> <http://schema.org/name> "Semiconductor Equipment and Materials International (Mountain View, CA)" .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/semiconductor_equipment_and_materials_international_mountain_view_ca> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791976905.nt> <http://rdfs.org/ns/void#inDataset> <http://purl.oclc.org/dataset/WorldCat/Works> .
<http://experiment.worldcat.org/entity/work/data/791976905.nt> <http://schema.org/about> <http://worldcat.org/entity/work/id/791976905> .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers_united_states> <http://schema.org/name> "Society of Photo-optical Instrumentation Engineers (United States)" .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers_united_states> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithography_electron_beam_congresses> <http://schema.org/name> "Lithography, Electron beam Congresses." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithography_electron_beam_congresses> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/rayons_x_applications_industrielles_congres> <http://schema.org/name> "Rayons X Applications industrielles Congrès." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/rayons_x_applications_industrielles_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_ray_lithography_congresses> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://viaf.org/viaf/149551508> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85148752> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791976905#Organization/semiconductor_equipment_and_materials_international_mountain_view_ca> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2008124340> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1181834> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/editor> <http://worldcat.org/entity/person/id/2634944148> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/55686050> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA. Pt. 2" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA. Pt. 1" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithography_industrial_applications_congresses> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://viaf.org/viaf/138507021> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1181874> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/55731687> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/840386307> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://viaf.org/viaf/139001886> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1011095> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://id.loc.gov/authorities/names/no2001094348> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/840385886> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2008114009> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII"@en .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2010100831> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithography_electron_beam_congresses> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://id.loc.gov/authorities/names/n80024416> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_faisceau_d_electrons_congres> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://worldcat.org/entity/person/id/2634944148> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1019884> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://viaf.org/viaf/159263522> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/masques_electronique_congres> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/rayons_x_applications_industrielles_congres> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/841343109> .
<http://worldcat.org/entity/work/id/791976905> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Book> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII : 24 - 26 February 2004, Santa Clara, California, USA Pt. 1" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85148749> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_rays_industrial_applications_congresses> .
<http://worldcat.org/entity/work/id/791976905> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/CreativeWork> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85148736> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/759722089> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA"@en .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/850467043> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers_u_s> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/alternateName> "Emerging lithographic technologies eight"@en .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/834760255> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/alternateName> "Emerging lithographic technologies eight" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85077608> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85081822> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh2009130002> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/492989175> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/masks_electronics_congresses> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1019883> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/639927760> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1181857> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithographie_applications_industrielles_congres> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/genre> "Conference papers and proceedings"@en .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/genre> "Conference papers and proceedings" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII 24-26 February 2004, Santa Clara, California, USA" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII 24-26 February 2004, Santa Clara, California, USA"@en .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/name> "Emerging lithographic technologies VIII 24-26 February, 2004, Santa Clara, California, USA" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/636940894> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/458750220> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/workExample> <http://www.worldcat.org/oclc/771360899> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.worldcat.org/fast/1000292> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://id.loc.gov/authorities/names/n90682619> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/alternateName> "Emerging lithographic technologies 8"@en .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/alternateName> "Emerging lithographic technologies 8" .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791976905#Meeting/conference_2004_02_24_26_santa_clara_calif> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/contributor> <http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers_united_states> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_rayons_x_congres> .
<http://worldcat.org/entity/work/id/791976905> <http://schema.org/about> <http://id.loc.gov/authorities/subjects/sh85084858> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithographie_applications_industrielles_congres> <http://schema.org/name> "Microlithographie Applications industrielles Congrès." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithographie_applications_industrielles_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers> <http://schema.org/name> "Society of photo-optical instrumentation engineers." .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers> <http://schema.org/name> "Society of Photo-optical Instrumentation Engineers." .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers> <http://schema.org/name> "Society of Photo-Optical Instrumentation Engineers." .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers> <http://schema.org/name> "Society of Photo-optical Instrumentation Engineers" .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_ray_lithography_congresses> <http://schema.org/name> "X-ray lithography Congresses." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_ray_lithography_congresses> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithography_industrial_applications_congresses> <http://schema.org/name> "Microlithography Industrial applications Congresses." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithography_industrial_applications_congresses> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/masques_electronique_congres> <http://schema.org/name> "Masques (Électronique) Congrès." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/masques_electronique_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_rayons_x_congres> <http://schema.org/name> "Lithographie par rayons X Congrès." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_rayons_x_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_rays_industrial_applications_congresses> <http://schema.org/name> "X-rays Industrial applications Congresses." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_rays_industrial_applications_congresses> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_faisceau_d_electrons_congres> <http://schema.org/name> "Lithographie par faisceau d'électrons Congrès." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_faisceau_d_electrons_congres> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/masks_electronics_congresses> <http://schema.org/name> "Masks (Electronics) Congresses." .
<http://experiment.worldcat.org/entity/work/data/791976905#Topic/masks_electronics_congresses> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Topic> .
<http://experiment.worldcat.org/entity/work/data/791976905#Meeting/conference_2004_02_24_26_santa_clara_calif> <http://schema.org/name> "Conference (2004.02.24-26 Santa Clara, Calif.)" .
<http://experiment.worldcat.org/entity/work/data/791976905#Meeting/conference_2004_02_24_26_santa_clara_calif> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://www.productontology.org/id/Meeting> .
<http://experiment.worldcat.org/entity/work/data/791976905#Meeting/conference_2004_02_24_26_santa_clara_calif> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Event> .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers_u_s> <http://schema.org/name> "Society of Photo-optical Instrumentation Engineers (U.S.)" .
<http://experiment.worldcat.org/entity/work/data/791976905#Organization/society_of_photo_optical_instrumentation_engineers_u_s> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://schema.org/Organization> .