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Organometallic Vapor-Phase Epitaxy Theory and Practice

This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices.

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  • "This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices."@en
  • "Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and the."@en
  • "Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and the special structures required for device applications. In addition, a comprehensive summary detailing the OMVPE results observed to date in a wide range of III-V and II-VI semiconductors is provided. This includes a comparison of results obtained through the use of other epitaxial techniques such as molecular beam epitaxy (MBE), liquid-phase epitaxy (LPE), and vapor phase epitaxy using halide transport."
  • "This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices. It is updated with new emphasis on the semiconducting nitride materials GaN and its alloys with In and Al. It emphasizes the newly understood aspects of surface processes. It contains a new chapter, as well as several new sections in chapters on thermodynamics and kinetics."
  • "This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices. Key Features * Updated with new emphasis on the semiconducting nitride materialsGaN and its alloys with In and Al * Emphasizes the newly understood aspects of surface processes * Contains a new chapter, as well as several new sections in chapters on thermodynamics and kinetics."
  • "This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices. Key Features * Updated with new emphasis on the semiconducting nitride materialsGaN and its alloys with In and Al * Emphasizes the newly understood aspects of surface processes * Contains a new chapter, as well as several new sections in chapters on thermodynamics and kinetics."@en

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  • "Electronic resource"
  • "Llibres electrònics"
  • "Electronic books"
  • "Electronic books"@en

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  • "Organometallic vapor-phase epitaxy: theory and practice"
  • "Organometallic Vapor-Phase Epitaxy Theory and Practice"
  • "Organometallic Vapor-Phase Epitaxy Theory and Practice"@en
  • "Organometallic vapor phase epitaxy theory and practice"
  • "Organometallic vapor-phase epitaxy : theory and practice"
  • "Organometallic vapor phase epitaxy : theory and practice"
  • "Organometallic vapor-phase epitaxy theory and practice"
  • "Organometallic vapor-phase epitaxy theory and practice"@en

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