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http://worldcat.org/entity/work/id/856160055

Plasma etching : fundamentals and applications

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http://worldcat.org/entity/person/id/2630211066

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http://worldcat.org/entity/person/id/2630211066

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"The focus of this book is on the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored."

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"Electronic books"
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"Plasma Etching: Fundamentals and Applications"
"Plasma etching : fundamentals and applications"
"Plasma etching : fundamentals and applications"@en
"Plasma etching fundamentals and applications"@en

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