"Surface contamination Prevention." . . "Online-Publikation" . . . . . . . "The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal \"Kash\" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology.-" . "Electronic books" . "Electronic books"@en . . . "Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a stateoftheart survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants Indepth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to groundbased and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal \"Kash\" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the EditorinChief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. Provides guidance on bestpractice cleaning techniques and the avoidance of surface contamination Covers contamination and cleaning issues at the nanoscale Includes an indepth look at ultrasonic cleaning" . . . . "Developments in Surface Contamination and Cleaning" . . "Developments in Surface Contamination and Cleaning - Detection, Characterization, and Analysis of Contaminants"@en . . . . "Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of thes."@en . "Particle deposition, control and removal"@en . "Particle deposition, control and removal" . . . . . . "Contamination detection and prevention."@en . . "Developments in surface contamination and cleaning" . "Developments in surface contamination and cleaning"@en . . . . . . . . . . . "Developments in surface contamination and cleaning. Particle deposition, control and removal" . . . . . . . "In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The c."@en . . . . "Aufsatzsammlung" . . . . "Developments in Surface Contamination and Cleaning - Methods for Removal of Particle Contaminants"@en . "Developments in surface contamination and cleaning fundamentals and applied aspects"@en . . "Developments in Surface Contamination and Cleaning Detection, Characterization, and Analysis of Contaminants" . "Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.-" . "Developments in surface contamination and cleaning fundamentals and applied aspects" . . . "Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ̥killer defects̲ today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.\" Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical.\" A single source document addressing everything from the sources of contamination to their removal and prevention.\" Amply referenced and profusely illustrated."@en . "Developments in surface contamination and cleaning : particle deposition, control and removal" . "Developments in surface contamination and cleaning : particle deposition, control and removal"@en . . . . . . . . . . . . . "Developments in surface contamination and cleaning methods for removal of particle contaminants" . "Developments in surface contamination and cleaning particle deposition, control and removal"@en . . . "Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal \"Kash\" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination Covers contamination and cleaning issues at the nanoscale Includes an in-depth look at ultrasonic cleaning."@en . . . "Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal \"Kash\" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination Covers contamination and cleaning issues at the nanoscale Includes an in-depth look at ultrasonic cleaning." . . "Developments in surface contamination and cleaning particle deposition, control and removal" . . . . . . . . . "He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination Covers contamination and cleaning issues at the nanoscale Includes an in-depth look at ultrasonic cleaning." . . . . . . . . . . "Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning.-" . . . . "Llibres electrònics" . . . . . . "Developments in surface contamination and cleaning : fundamentals and applied aspects" . . . "Developments in surface contamination and cleaning : fundamentals and applied aspects"@en . "Developments in Surface Contamination and Cleaning Fundamentals and Applied Aspects"@en . "Civil engineering." . . "Particules (Matière) Mesure." . . "Cleaning." . . "Traitement de surface." . . "Surfaces (Technologie) Analyse." . . "Nettoyage." . . "Teilchen." . . "Electronic books." . . "Surfaces (Technologie) Inspection." . . "Kontamination." . . "Revêtements." . . "Contamination de surface Prévention." . . "Contamination de surface Prevention." . "Contaminación." . . "Poussière, Lutte contre la." . . "Powłoki." . . "Surfaces (Technology) Inspection. Surface contamination Prevention. Particles Measurement. Cleaning. Coatings. Dust control." . . "Surfaces (Technology) Inspection." . . "TECHNOLOGY & ENGINEERING Nanotechnology & MEMS." . . "Engineering." . . "Powierzchnie (technologia)." . . "Reinigungsverfahren." . . "Contamination de surface." . . "Oczyszczanie." . . . . "Beschichtung." . . "Surfaces (Technologie)" . . "Dust control." . . "Oberfläche." . . "Medio ambiente, Ingeniería del." . . "Particles Measurement." . . "Coatings." . .